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Semiconductor Grade
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Ammonium fluoride
Ammonium fluoride
Ammonium fluoride

Ammonium fluoride is a crucial chemical in the semiconductor industry, primarily used for wafer surface cleaning and etching. It removes native silicon oxide layers to provide a clean surface and, when combined with hydrofluoric acid, forms a Buffered Oxide Etchant (BOE), enabling stable and controlled oxide layer etching. Additionally, ammonium fluoride is employed in process refinement and surface activation, enhancing material adhesion and improving process precision, making it an essential reagent in semiconductor manufacturing. 

Detailed introduction

Applications include: 

  • Wafer Surface Cleaning: Effectively removes native silicon oxide layers, ensuring a clean surface for further processing. 

  • Buffered Oxide Etching (BOE): When combined with hydrofluoric acid, provides stable and controlled etching for oxide layer removal. 

  • Surface Activation: Enhances material adhesion, crucial for thin-film deposition and semiconductor manufacturing. 

  • Process Refinement: Improves precision in various semiconductor processes, ensuring high-quality results. 

Our company offers Semiconductor Grade Ammonium Fluoride with a concentration of 40% in Tote and Drum packaging, providing flexible solutions for various operational needs. For any specific requirements or tailored solutions, please feel free to contact us. 

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