Hydrofluoric Acid
Hydrofluoric Acid

Semiconductor Grade, Ultra-Pure, Hydrofluoric acid (HF) is a vital chemical in the semiconductor industry, primarily used for cleaning and etching silicon wafers. It precisely removes silicon oxide (SiO₂) layers, exposing a pure silicon surface and effectively eliminating organic and inorganic contaminants, ensuring a high-quality processing environment. Additionally, its selective etching properties make it ideal for creating precise circuit patterns, enhancing component miniaturization and reliability. Hydrofluoric acid is indispensable in semiconductor manufacturing. 

Detailed introduction

Applications include: 

  • Silicon Wafer Cleaning: Removes native oxide layers, preparing the surface for further processing. 

  • Etching: Used for precise etching of circuit patterns, essential for high-performance devices. 

  • Contaminant Removal: Effectively eliminates organic and inorganic contaminants from wafer surfaces. 

  • Surface Preparation: Ensures smooth and clean surfaces for various semiconductor processes. 

Our company offers Hydrofluoric Acid in two concentrations: 

  • 25% HF is available in Lorry (Iso Tank) packaging. 

  • 49% HF is available in Lorry (Iso Tank), Tote, and Drum packaging. 

For customized concentration or packaging requirements, please feel free to contact us for tailored solutions